Welcome to Raymiy Vacuum Technology (Changzhou) Co., Ltd.
The sputtering technology of MF magnetron coating equipment is characterized by stable sputtering, dielectric film deposition rate is much higher than general DC magnetron sputtering, and the film bonding force is further enhanced, which is the mainstream of today's magnetron technology.
This equipment has no waste gas, waste water and dust, and it is an excellent large-scale production environment-friendly equipment. The form can be a vertical double-opening door structure, or can be in the form of a production line, and can be customized according to different requirements.
It can be used for planar targets, cylindrical targets, twin targets, targets and other forms of intermediate frequency sputtering target structures and layouts. This type of equipment is widely used in watch, strap, mobile phone case, golf equipment, hardware, tableware and other decorative plating such as TiN, TiC, TICN, TiAIN, CrN.
| Vacuum chamber size |
Ф800× H900mm |
Ф1100× H1200mm |
Ф1350× H1250mm |
Ф1600× H1250mm |
Ф1900× H1250mm |
Continuous line mode |
| Film type | Multi-functional metal film, composite film, transparent conductive film, increased return film, electromagnetic shielding film, decorative film, etc. | |||||
| Power type | DC magnetron power supply, medium frequency magnetron power supply, high voltage ion bombardment power supply | |||||
| Target type | DC magnetron target, medium frequency twin target, planar target, cylindrical target | |||||
| Vacuum system | Mechanical pump (RP) + Roots pump (RSP) + diffusion pump (DP or optional: molecular pump, cryogenic system -140 ° C) + maintenance pump (HP) | |||||
| Ultimate vacuum | 6× 10-4pa (no load, clean room) | |||||
| Production performance | The no-load atmosphere is pumped to 9× 10-3pa is less than 10 minutes, and two 60Kw high-power magnetron sputtering electrodes are quickly and extensively coated. | |||||
| Control system | Touch screen (or industrial computer) + PLC, real-time monitoring of big data | |||||
| Remarks | The vacuum chamber size can be customized according to customer's products and special process requirements | |||||
