Welcome to Raymiy Vacuum Technology (Changzhou) Co., Ltd.
Multi-arc sputtering Coating Equipment
The device ignites the evaporation source (cathode) under vacuum, and forms a self-sustaining arc discharge with the anode, that is, ions which discharge the cathode material from the bright spot of the cathode arc. Due to the local concentration of the current, the Joule heat generated locally causes the cathode material to be partially localized. Explosive plasmaization, a device that combines with a reactive gas under the action of a workpiece bias to deposit a film layer on the surface of the workpiece. There are advantages of fast deposition rate, high ionization rate, large ion energy, simple equipment operation, low cost and large production capacity.
| Equipment model | RM-MAS1000 | RM-MAS1150 | RM-MAS1200 | RM-MAS1600 | |
| Vacuum chamber size | 1000×1200 | 1150×1200 | 1200×1300 | 1600×1800 | 1600×2200 |
| Film type | Gold titanium nitride, black titanium carbide, colorful titanium oxide, wear-resistant film, super hard film, diamond film, metal decorative film, etc. | ||||
| Power type | DC power supply, intermediate frequency power supply, arc power supply, filament power supply, activation power supply, pulse bias power supply | ||||
| Multi-arc target | 5 or 18, 1 or 2 cylindrical targets for multiple arc targets | ||||
| Twin target | Intermediate frequency twin column target or planar target (1 to 4 pairs) | ||||
| Vacuum chamber structure | Vertical front door structure (double water jacket or sink cooling), rear suction system | ||||
| Vacuum system | Mechanical pump (RP) + Roots pump (RSP) + diffusion pump (DP or optional: molecular pump, cryogenic system -140 ° C) + maintenance pump (HP) | ||||
| Heating system | Normal temperature to 350 degrees adjustable and controllable (PID temperature control), stainless steel heating tube heating | ||||
| Inflatable system | Mass flow controller (1-4 channels) | ||||
| Ultimate vacuum | 6×10-4pa (no load, clean room) | ||||
| Pumping time | No-load atmosphere is pumped to 5×10-3pa for less than 13 minutes | ||||
| Pressure holding ratio | 1h≤0.6pa | ||||
| Workpiece rotation | Up or down rotation + public self-transition frequency stepless controllable adjustable, 0-20 rev / min | ||||
| control method | Manual + semi-automatic / touch screen + PLC | ||||
| Remarks | The vacuum chamber size can be customized according to customer's products and special process requirements. | ||||
